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Spectroscopy / Ellipsometry / Radiometry / Physical quantities / Refractive index / Optics / Indium nitride / Chemistry / Physics / Measurement


doi:[removed]j.tsf[removed]
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Document Date: 2008-06-18 13:28:47

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File Size: 279,69 KB

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City

Orlando / Barcelona / Cork / Zagreb / New York / Oxford / /

Company

ARTICLE IN PRESS / Y.J. Cho N.V. / Pergamon Press / Thin Solid Films / B. Dieny A.E. / Elsevier B.V. / M. Ramon N.V. / X. Shi S.A. / /

Country

Spain / Ireland / /

/

Facility

Tyndall National Institute / Croatia University College / /

IndustryTerm

metrology tool / chemical cleaning / manufacturing conditions / photon energy / good solutions / transition energy / structural characterization tool / energy dependence / high energy range / optical coating technology / peak transition energy / thin film computation algorithms / energy / using standard thin film computation algorithms / /

Organization

Ruđer Bošković Institute / Universitat de Barcelona / Government of Catalonia / Thin Film Division / Tyndall National Institute / /

Person

S. Lhostis / V / G.E. Jellison Jr. / G.E. Jellison Jr / D. Ha / Mircea Modreanu / Salvador Bosch / J. Vac / Jordi Sancho-Parramon / B.E. White Jr. / Lee Maltings / Michel Stchakovsky / /

Position

Hb / model / Corresponding author / King / /

ProvinceOrState

New York / /

Technology

CMOS technology / CMOS technologies / JSP / dielectric / thin film computation algorithms / simulation / optical coating technology / /

URL

www.elsevier.com/locate/tsf / www.sciencedirect.com / /

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