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Electromagnetic radiation / Photonics / Diffraction grating / Extreme ultraviolet / Grating / Interference lithography / Electron beam lithography / Extreme ultraviolet lithography / Long-period fiber grating / Optics / Diffraction / Optical devices


Nanostructuring News August 2010 25nm half-pitch EUV fabricated gratings now available Eulitha continues to add higher resolution structures to its line of standard
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Document Date: 2014-05-05 05:11:39

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Company

Eulitha AG / /

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Facility

Paul Scherrer Institute / INKA Institute / /

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IndustryTerm

microresist technology / interference lithography technology / e-beam / spectroscopy applications / /

Organization

INKA Institute / Paul Scherrer Institut / Paul Scherrer Institute / /

Person

Paul Scherrer / /

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ProgrammingLanguage

NIL / /

Technology

spectroscopy / lithography / EUV interference lithography technology / microresist technology / /

URL

www.eulitha.com / /

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