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Extreme ultraviolet lithography / Extreme ultraviolet / Microtechnology / Immersion lithography / Computational lithography / Interference lithography / Photoresist / Photomask / College of Nanoscale Science and Engineering / Materials science / Electromagnetic radiation / Technology


Document Date: 2015-04-13 10:58:59

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City

Ni / Ta / San Jose / New York / /

Company

GLOBALFOUNDRIES Inc. / CHs / SAMSUNG Electronics Co. Ltd. / ARM Inc. (United States) As / Gigaphoton Inc. / Mitsubishi electric / McGraw-Hill / NIST Physics Laboratory / Fastlitho Inc. / LER / JSR Corp. / ASML Netherlands B.V. / IBM Corp. / FUJIFILM Corp. / Contents Mircea V. Dusa ASML US Inc. / Ushio Inc. / SEMATECH Inc. / IMPACT / Tokyo Ohka Kogyo Co. Ltd. / Mentor Graphics Corp. / EUV / Tokyo Electron Kyushu Ltd. / Rigaku Innovative Technologies Inc. / ASML US Inc. / JSR Micro Inc. / optiX fab GmbH / Intel Corp. / SK Hynix Inc. / Lawrence Berkeley National Laboratory / Tokyo Electron Limited / HP / Tokyo Electron Europe Ltd. / STMicroelectronics / ASML Korea / ASML Taiwan Ltd. / JSR Micro N.V. / /

Country

Switzerland / Japan / Germany / United States / /

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Event

M&A / Business Partnership / /

Facility

San Jose Convention Center / NIST Physics Laboratory / Paul Scherrer Institute / Bruce W. Smith Rochester Institute of Technology / National Institute of Standards and Technology / SUNY College / National Institute of Science / SUNY College of Nanoscale Science / The Institute of Scientific / IBM EUV Center / Massachusetts Institute of Technology / IBM EUV Center of Excellence / /

IndustryTerm

technology specifications / exposure tools / contact hole applications / magnetron tools / high energy radiation gives / energy loss / energy deposition / high volume manufacturing / discharge pulse energy / electron energy loss spectroscopy / manufacturing requirements / metal oxide nanoparticles / pre-pulse technology / lithography applications / low energy electrons / manufacturing process / energy / chemical reactions / ligand-stabilized metal oxide nanoparticle photoresists / conventional positive tone imaging / radiation energy redistribution / Negative-tone imaging / energy delivery / highvolume manufacturing / sufficient energy / experimental results evaluating technologies / manufacturing quality / e-beam / manufacturing / organic solvent developer / low-energy / diblock copolymer systems / high-volume manufacturing / lower energy secondary electrons / reverse tone imaging process / technology specification requirements / photon energy / semiconductor devices / focus technology / printing behavior / inspection tools / production ready processing / energy recovery / less probable higher energy / respective energy loss probability density functions / technology nodes / printing / decomposition products / negative tone imaging / positive tone imaging / near future powerful devices / tone imaging / printing circuits / energy absorption statistics / technology node development / actinic mask inspection tools / metrology systems / technology node / exposure tool / high-energy electron absorption / /

Organization

Fraunhofer-Institut für Angewandte Optik / Rochester Institute of Technology / Argonne National Lab. / U.S. Department of Energy / Massachusetts Institute of Technology / Purdue Univ. / Cornell Univ. / National Institute of Standards and Technology / Osaka Univ. / National Institute of Science and Technology / Paul Scherrer Institut / Institute of Scientific and Industrial Research / Boston Univ. / Fraunhofer-Institut für Lasertechnik / SUNY College / Univ. of California / Univ. of Arizona / Leiden Univ. / office of Science / New Energy and Industrial Technology Development Organization / SUNY College of Nanoscale Science and Engineering / Lawrence Berkeley National Lab. / Paul Scherrer Institute / /

Person

Eric Tsui / Takeshi Shimoaoki / Tatyana Sizyuk / James Word / Nelson M. Felix / Henry C. Herbol / Jing Jiang / Robert L. Brainard / Robert Leitel / Makoto Momota / Rudolf M. Tromp / Frank Scholze / Christian Wagner / Alek Chen / Ken A. Goldberg / Toshiro Itani / Alexander A. Schafgans / Tobias Fiedler / Daniel J. Riggs / Daniel Geelen / Yoshi Hishiro / Joerg Mellman / Wayne J. Dunstan / Erik R. Hosler / Jun Sung Chun / Rim Jung / Thomas J. Watson / Matthew E. Colburn / Eric M. Gullikson / Shinichiro Kawakami / Anne-Marie Goethals / Greg Yeric / Kyu-Tae Sun / Yasin Ekinci / Patrick P. Naulleau / Ahmed Hassanein / Shaul Aloni / Frank Goodwin / Danilo De Simone / Pei-Yang Yan / Kenji Hoshiko / Uwe D. Zeitner / David C. Brandt / Moon Lim / Yusuke Teramoto / Nicole Saulnier / Martin Burkhardt / Lei Sun / Anita Fumar-Pici / Marco Perske / Steven E. Grantham / Christopher K. Ober / Doni Parnell / Taik Kwon / Michael S. Yeung / Nigel R. Farrar / Anil Karumuri / Toru Kimura / Takahiro Kozawa / Shannon B. Hill / Andrew R. Neureuther / Marcus Trost / Yuriy Y. Platonov / Obert R. Wood II / Gregory Denbeaux / Kunihiko Kasama / Christian Laubis / Akihisa Nagano / Takakazu Kimoto / Patrick A. Kearney / Hiroki Yamamoto / Li Li / Joseph S. Santillan / Karen E. Petrillo / Stefan Risse / Justin Turok / Min Kim / Bassem Hamieh / James M. Blackwell / Takahiro Goto / Ion Beam / Alberto Pirati / Genevieve Beique / Margarete Kops / Ben Zhang / Felix Küpper / Takashi Saitou / Charles Tarrio / Juan Andres Torres / Lin L. Cheong / Daniel J. Brown / Kathleen Nafus / Paul Scherrer / Ron Kool / David Gilmer / Erik A. Verduijn / Ralf Steinkopf / Bárbara Santos / Emmanuel P. Giannelis / Nam Ahn / Moshe E. Preil / Robert J. Rafac / Hagen Pauer / Michael J. Leeson / Chi-Chun Liu / Hisashi Nakagawa / Toru Tsuchihashi / Hideaki Tsubaki / Philippe Foubert / J. Cameron / V / Lawrence Berkeley / Marie E. Krysak / Zheng S. Tao / Koichi Matsunaga / Michaela Vockenhuber / Ralf Kops / Yoichi Tanino et.al / John C. Arnold / Tuan Vo / Julius Joseph / Kazuo Kobayashi / Mark Neisser / Masafumi Hori / Jung Yum / Guido Mertens / Matthew Graham / Liam Wisehart / Hans Meiling / Igor V. Fomenkov / Sven Schröder / Victor Soltwisch / Reyes Sierra / /

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Position

RT / General / Driver / Symposium Co-Chair / collector / Director / /

Product

CO2-Sn / Monte Carlo / ntd / /

ProgrammingLanguage

NGL / ML / /

ProvinceOrState

New York / California / Arizona / Massachusetts / /

PublishedMedium

Proceedings of SPIE / /

SportsEvent

nBA / /

Technology

radiation / 3-D / SRAM / integrated circuits / focus technology / Alternative Lithographic Technologies / spectroscopy / Etch Technology / GUI / semiconductor / pre-pulse technology / semiconductor devices / Lithography / key technologies / Process Control / PDF / laser / FEL technology / lasers / experimental results evaluating technologies / simulation / /

URL

WWW.SPIE.ORG/AL / /

SocialTag