| Document Date: 2014-03-30 21:14:00 Open Document File Size: 157,59 KBShare Result on Facebook
City Toyama / San Jose / / Company Nanoimprint CROSSCUT NEEDS AND POTENTIAL SOLUTIONS / / Country Japan / / Facility Factory Integration / / IndustryTerm finFET devices / logic devices / exposure tools / mask infrastructure / semiconductor device / 193nm exposure tools / technology needs / process technology / semiconductor manufacturing / functioning devices / potential solution / pilot tool / Metal levels / potential solutions / post processing / actual chip / pilot tools / e-beam / e-beams / actual working tools / exposure tool / finFET containing chip / metal layers / / Organization Directed Self Assembly / Self Assembly / / Technology semiconductor / finFET containing chip / defect LITHOGRAPHY TECHNOLOGY / existing process technology / flash memory / 1 Lithography Technology / alternative imaging technologies / actual chip / patterning technology / Logic chips / LITHOGRAPHY / Lithography Technology / Simulation / Process control / flash / /
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