Perot / Ge / ITN / Micro Electro Mechanical Systems / C 2014 AIP Publishing LLC / /
Country
Germany / Austria / United States / /
Currency
pence / USD / EUR / / /
Facility
National Institute of Standards and Technology / University of Vienna / University of Colorado / /
IndustryTerm
wet chemical etch / optoelectronic applications / plasma-enhanced chemical vapor deposition / metal-organic chemical vapor deposition / metal / membrane chips / Post-processing analysis / chemical / /
Organization
Clare Boothe Luce Foundation / Vienna Science and Technology Fund / Austrian Science Fund / U.S. National Science Foundation / JILA / European Research Council / Department of Physics / Vienna Center for Quantum Science and Technology / Institut f€ / National Institute of Standards and Technology / Institute for Gravitational Physics / Taiwan Ministry of Education / University of Vienna / Faculty of Physics / University of Colorado / Boulder / European Commission / /
Person
Ramon Moghadas Nia / M. Sheik-Bahae / Jason Hoelscher-Obermaier / O. Arcizet / C. Yang / F. Marquardt / M. S. Feld / R. Braive / Nat / I. Sagnes / Cindy A. Regal / T. J. Kippenberg / K. An / S. R. Kurtz / A. C. Bleszynski Jayich / Karoline Siquans / I. Robert-Philip / Jonas Schmöle / Claus Gärtner / D. J. Hagan / R. R. Dasari / Robert Yanka / Markus Aspelmeyer / Jonas Schmo / Thomas P. Purdy / E. W. Van Stryland / Garrett D. Cole / A. Beveratos / / /
Tensile-strained InxGa1xP membranes for cavity optomechanics Garrett D. Cole, Pen-Li Yu, Claus Gärtner, Karoline Siquans, Ramon Moghadas Nia, Jonas Schmöle, Jason Hoelscher-Obermaier, Thomas P. Purdy, Witlef Wieczorek,