8 International Journal / SiCH3 / Hindawi Publishing Corporation International / Creative Commons / Thin Solid Films / /
Country
Japan / / /
Facility
Osaka Prefecture University / Osaka Municipal Technical Research Institute / Japan Innovation Plaza / /
IndustryTerm
lower electric and chemical resistivity / low-surface free energy / organic electronics / multilayered electronic devices / electric devices / silylmethyl / free energy / higher cross-linked siloxane network / surface free energy / chemical modification / printed electronics / wide technology / electricpaper device / lower surface free energy / less energy consumption / toluene solution / vacuum processing / low-energy surfaces / low surface free energy / electronic devices / organic transistor applications / performance device / cyano / dense siloxane networks / /
Organization
Osaka Municipal Technical Research Institute / American Chemical Society / Electronic Material Research Division / Osaka Prefecture University / Osaka / vol. / Department of Physics and Electronics / /
Person
C. D. Sheraw / D. J. Gundlach / P. J. Brown / Z. Bao / V / T. N. Jockson / / /
Position
Academic Editor / /
PublishedMedium
Japanese Journal of Applied Physics / Journal of Applied Physics / Chemistry Letters / Applied Physics Letters / Advanced Functional Materials / Advanced Materials / Journal of the American Chemical Society / /
Hindawi Publishing Corporation International Journal of Polymer Science Volume 2012, Article ID[removed], 10 pages doi:[removed][removed]Review Article