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Manufacturing / 10 micrometres / Wafer / Microsphere / Deep reactive-ion etching / Particle size / Silicon carbide / Nanoparticle / Chemistry / Materials science / Semiconductor device fabrication


GENESIS CONCENTRATOR TARGET PARTICLE CONTAMINATION MAPPING AND MATERIAL IDENTIFICATION Michael J. Calaway 1, Melissa C. Rodriguez 2, and Judith H. Allton[removed]Jacobs (ESCG) at NASA Johnson Space Center, Houston, TX (2)
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Document Date: 2013-09-16 21:16:11

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File Size: 1,57 MB

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City

Houston / /

Company

Geocontrol Systems / /

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Facility

Scale bar / NASA Johnson Space Center / Johnson Space Center / Open University / /

IndustryTerm

white paint / chemical vapor / chemical signature / possible white paint / crash site / Chemical cleaning techniques / /

Organization

National Aeronautics and Space Administration / Open University / Johnson Space Center / /

Person

Michael J. Calaway / Dimitri Papanastassiou / Melissa C. Rodriguez / Don Burnett / Judith H. Allton / /

Position

collector / target using Surveyor / /

ProvinceOrState

Utah / /

Technology

CVD / /

SocialTag