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Electronic engineering / Technology / MOSFET / Synopsys / Silicon-germanium / Transistor / Chemistry / Multigate device / Multiple patterning


Designing with FinFETs Evolution or Revolution GSA meeting Jamil Kawa Jan 23, 2013
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Document Date: 2014-01-22 10:43:55


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File Size: 1,41 MB

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Company

Synopsys / IBM / /

IndustryTerm

193nm immersion lithography tools / 20nm technology / etch technology / still be produced using 193nm immersion lithography tools / /

Organization

General Services Administration / /

Person

Jamil Kawa Jan / Rdiff Rext / /

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Position

General / cfo / /

ProgrammingLanguage

RC / /

Technology

etch technology / 20nm technology / Lithography / SRAM / /

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