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Materials science / Technology / Coatings / Atomic layer deposition / Thin-film optics / Thin film / Sputtering / Anti-reflective coating / Titanium nitride / Chemistry / Semiconductor device fabrication / Thin film deposition


Atomically precise surface and interface engineering via atomic layer deposition to enable high-performance materials, detectors, and instruments F. Greer, M.E. Hoenk, T.J. Jones, B.C. Jacquot, M. Dickie, S. Monacos, and
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Document Date: 2011-12-02 14:35:39


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File Size: 2,55 MB

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Company

B.C. Jacquot S.P. / Si 10000 Counts HfO2 8000 6000 4000 Hf / Novellus Systems / Si 12000 Sputtered Hf / PEALD Hf / Si PEALD Hf / /

Facility

R. Leduc Jet Propulsion Laboratory/California Institute of Technology E. Hamden / University of Colorado Patrick Morrissey / University M. Beasley / Christopher Martin California Institute of Technology / /

IndustryTerm

chemical process / iALD / fabricated devices / /

Movie

Wavelength / /

MusicGroup

M.E. / /

Organization

University of Colorado / California Institute of Technology / Columbia University / S. Nikzad P. Day and R. Leduc Jet Propulsion Laboratory/California Institute of Technology E. Hamden / /

Person

Frank Greer / Al Al Al Al Al Al Al Al / Carol Garland / /

PublishedMedium

Applied Physics Letters / /

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