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Semiconductor device fabrication / Ultraviolet radiation / Coatings / Laser machining / Pulsed laser deposition / Zinc oxide / Ion beam assisted deposition / Nanoparticle / Thin film / Chemistry / Thin film deposition / Materials science


Applied Mechanics and Materials Vol[removed]pp 55-59 © (2014) Trans Tech Publications, Switzerland doi:[removed]www.scientific.net/AMM[removed]Researching Influence of IBAD PLD Parameters on Properties of Nanocrystall
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Document Date: 2014-01-13 02:20:37


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City

Weinheim / /

Company

WILEY-VCH Verlag GmbH & Co. KGaA / Kaufman & Robinson Inc. / Neocera Co. / EcopiaCorp / Micro Technologies / /

Country

Switzerland / Russia / United States / Korea / /

/

Facility

United Kingdom University / Kelvin Building / University of Glasgow Kelvin Nanocharacterisation Centre / Belarusian State University of Informatics / Southern Federal University / University of Glasgow / /

IndustryTerm

background gas pressures / manufacturing nanocrystalline / energy density laser pulses / laser energy density ranging / nanoelectronic devices / manufacturing films / industrial applications / sensor devices / background gas pressure / gas pressure / microsystems technology / energy densities / high sensitivity gas sensor working / energy density / chemical vapor deposition / gas sensors / manufacturing / chemical and electrical properties / laser pulse energy / ionizable gas / energy / functional elements nanosystem equipment / /

Organization

Glasgow Kelvin Nanocharacterisation Centre / United Kingdom University / School of Physics and Astronomy / Southern Federal University / University of Glasgow / Belarusian State University of Informatics and Radioelectronics / Russian Foundation for Basic Research / /

Person

Ion Beam Assisted / Yasuhiro Iijima / Hitoshi Tabata / Takashi Saitoh / /

PublishedMedium

Physica B / Journal of Luminescence / Condensed Matter / /

Technology

Laser / microsystems technology / chemical vapor deposition / /

URL

www.ttp.net / www.scientific.net/AMM.481.55 / /

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