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Thin film deposition / Semiconductor device fabrication / Crystallographic defects / Crystals / Lattice constant / Epitaxy / Strain engineering / Molecular beam epitaxy / Solid / Materials science / Condensed matter physics / Matter


www.advmat.de www.MaterialsViews.com COMMUNICATION Wafer-Scale Strain Engineering of Ultrathin Semiconductor
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Document Date: 2011-08-06 18:23:30


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City

Weinheim / Hobart / Pasadena / London / /

Company

B. E. Weir L. C. / John Wiley & Sons Inc. / WILEY-VCH Verlag GmbH & Co. KGaA / I. C. Bassignana / Academic Press Inc / Harry A. Atwater Semiconductor / Ge / G. M. Kimball S. P. / /

Country

United States / /

/

Facility

Applied Physics Calfornia Institute of Technology / Prof. H. A. Atwater Kavli Nanoscience Institute California Institute of Technology / Wiley Online Library / Kavli Nanoscience Institute / Caltech Materials Science TEM facility / /

IndustryTerm

elastic energy / energy storage / metalorganic chemical vapor deposition / optoelectronic devices / overall energy / energy dissipation / low energy portion / low-energy portion / Online Library / electronics / device applications / parameter power law expression / energy bandgap / energy / /

Organization

California Institute of Technology / National Science Foundation / US Department of Energy Solar Energy Technologies Program / Institute of Technology / Kavli Nanoscience Institute / /

Person

Dennis M. Callahan / Stanley P. Burgos / N. Puetz / Gregory M. Kimball / Marina S. Leite / Nat / M. E. Twigg / T. Shiu / M. S. Leite / Emily C. Warmann / /

Position

author / C. J. Miner / representative / /

ProvinceOrState

Pennsylvania / California / /

PublishedMedium

Soft Matter / /

Technology

semiconductor / laser / semiconductors / X-ray / lasers / chemical vapor deposition / /

URL

www.advmat.de / www.MaterialsViews.com / /

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