2008 International Workshop on EUV Lithography

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Date: 2016-06-11 13:18:30 Extreme ultraviolet Extreme ultraviolet lithography Cymer SUNY Poly Colleges of Nanoscale Science and Engineering Ultraviolet Lithography Laser Excimer laser ASML Holding		2008 International Workshop on EUV Lithography Add to Reading List Source URL: www.euvlitho.com Download Document from Source Website File Size: 1,95 MB Share Document on Facebook

	Normal-incidence efficiencies of multilayer-coated laminar gratings for the Extreme-Ultraviolet Imaging Spectrometer on the Solar-B mission John F. Seely, Charles M. Brown, David L. Windt, Soizik Donguy, and Benjawan Kjo DocID: 1vrTZ - View Document
	Stability of extreme ultraviolet multilayer coatings to low energy proton bombardment M.G. Pelizzo,1,2,* Alain Jody Corso,1,2 Paola Zuppella,1,2 D.L. Windt,3 G. Mattei,4 P. Nicolosi1,2 1 DocID: 1vkNm - View Document
	Solar Backscatter Ultraviolet Instrument (SBUV/2) Version 8 Ozone Retrieval Algorithm Theoretical Basis Document (V8 ATBD) Edited by L. Flynn (Last Revision February 2, 2007) Background The Solar Backscatter Ultraviolet DocID: 1vj5o - View Document
	Article pubs.acs.org/journal/apchd5 Indium for Deep-Ultraviolet Surface-Enhanced Resonance Raman Scattering Yasuaki Kumamoto,† Atsushi Taguchi,†,‡ Mitsuhiro Honda,‡ Koichi Watanabe,‡ Yuika Saito,*,‡ DocID: 1vcd9 - View Document
	Erythemal Exposure Data Product The Erythemal Exposure data product is an estimate of the daily integrated ultraviolet irradiance, calculated using a model for the susceptibility of caucasian skin to sunburn (erythema). DocID: 1v9UR - View Document