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Microtechnology / Metamaterials / Optics / Light-emitting diodes / Photolithography / Photomask / Electron beam lithography / Resist / Photoresist / Materials science / Physics / Technology


www.led-professional.com ISSN 1993-890X Review
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Document Date: 2014-05-05 05:16:07

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File Size: 1,27 MB

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Company

Quantum Electronics / EV Group / Diodes / Eulitha AG / /

IndustryTerm

diffractive self-imaging / printing resolution / mask aligner technology / printing properties / photonic applications / printing / optical solution / overall efficiency solutions / manufacturing technique / exposure printing / nm printing resolution / projection imaging / industrial applications / mobile and automotive applications / technology information / typical solution / final device / resolution applications / manufacturing cost / versatile and flexible tool / discussed printing capabilities / e-beam / manufacturing / light management / target applications / /

Person

Boris Považay / Christian Dais / Alberto Montaigne Ramil / Harun H. Solak / Francis Clube / Peter Cairoli / Thorsten Matthias / Thomas Uhrman / Markus Wimlinger / Roman Holly / Thomas Uhrmann / Crystal Growth / Harun Solak / /

Position

straight forward / /

PublishedMedium

Optics Express / Applied Physics Letters / /

Technology

semiconductor / radiation / OLED / 37 TECHNOLOGY / LED chip / wide process control TECHNOLOGY / Lithography / mask aligner technology / 37 2013 TECHNOLOGY / photolithography / /

URL

www.led-professional.com / /

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