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Optical devices / Diffraction / Diffraction grating / Photonics / Superlens / Photoresist / Electron beam lithography / Grating / Photolithography / Physics / Optics / Materials science


Document Date: 2009-05-05 11:33:36


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Company

Clariant / Pendry / /

Country

United States / /

Currency

USD / /

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Event

Person Communication and Meetings / /

Facility

University of Canterbury / Richard J. Blaikie MacDiarmid Institute / University of Canterbury Brownlie Scholarship / /

IndustryTerm

example imaging result / high gas flow rate etch / metal film / field optical systems / plasmonic systems / sub-wavelength imaging / far-field imaging / Near-field imaging / near-field imaging properties / unambiguous super-resolution imaging / classical reduction self-imaging / period-reduced self imaging process / near-field imaging experimental arrangement / near-field imaging work / imaging / /

Organization

Department of Electrical and Computer Engineering / Richard J. Blaikie MacDiarmid Institute for Advanced Materials and Nanotechnology / Optical Society of America OCIS / MIT / University of Canterbury Brownlie Scholarship / Royal Society of New Zealand / University of Canterbury / Marsden Fund / /

Person

Karl Süss / David O. S. Melville / Maan Alkaisi / James Goodberlet / Hank Smith / Gary Turner / Helen Devereux / Alan Wright / Andrew Thomson / Richard J. Blaikie / Conrad Wolf / Dimension / /

Position

model / /

PublishedMedium

OPTICS EXPRESS / Advanced Materials / /

Technology

dielectric / microwave / lithography / simulation / photolithography / planarisation / /

URL

http /

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