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![]() | Document Date: 2013-06-18 09:13:00Open Document File Size: 379,36 KBShare Result on FacebookCityKano / London / Grenoble / /CompanyS. S. P. / /CountryUnited States / / /FacilityTransistors Tunnel / Tunnel MagnetoResistance / /IndustryTermmemory technologies / energy barrier / time domain imaging / non-volatile memory technology / Energy minimization / semiconductor device / semiconductor-free metal/insulator structure / mainstream semiconductor technology / volatile and non-volatile memory technologies / energy cost / magnetic tape storage systems / technology proposing / digital consumer products / normal metal / magnetostatic energy / higher switching energy / mainstream technology / feedback network / transition metal / thermal energy / metal/insulator/metal diode / memory array using magnetic tunnel junction devices / mechanical systems / mode magnetoresistance random access memory devices / /MovieSpin / /OrganizationDRAM SRAM / /PersonP. P. Freitas / V / D. Pescia / V / A. Iovan / V / J. Grollier / V / G. Borghs / O. Redon / M. Hashimoto / M. Kerekes / P. P. Freitas / C. S. Lee / J.P. Nozi`eres / B. Dieny / Nat / M. Durlam / /Technologysemiconductor / one technology / memory technologies / RAM / MRAM technology / Flash technology / non-volatile memory technology / Flash memory / disk drive / dielectric / mainstream technology / random access / SRAM / mainstream semiconductor technology / volatile and non-volatile memory technologies / FLASH / /SocialTag |