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211	Marvell NanoLab Member login Lab Manual Contents Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2013-09-25 16:17:26 Valve Water industry Internal combustion engine Carbon dioxide Chemistry Piping Plumbing
212	Chapter 4.4 Standard g-line Photoresist Processes Standardized g-Line Photoresists at the Marvell Nanofabrication Laboratory Dow Chemical S1818 Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2014-08-21 13:37:59
213	Marvell NanoLab Member login Lab Manual Contents Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2012-05-22 00:50:46 Technology Chemistry RCA clean Etching Wafer Microelectromechanical systems Laboratory glassware Piranha solution Semiconductor device fabrication Materials science Microtechnology
214	Marvell Nanolab Member login Lab Manual Index Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2013-01-09 10:07:03 Household chemicals Laboratory equipment Chemical waste Water pollution Sink Solvent cabinet Solvent Acetic acid Fire extinguisher Chemistry Waste Technology
215	Marvell NanoLab Member login Lab Manual Contents Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2014-10-01 10:07:02 Photomask Mask set Electronic engineering Archive formats GDSII GCA
216	Marvell NanoLab Member login Lab Manual Contents Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2011-10-17 15:26:12 Materials science Photoresist Polymers Sink Heated bath Carbon dioxide Chemistry Plumbing Laboratory equipment
217	Chapter 4.3 Standard i-line Photoresist Processes Standardized i-Line Photoresists at the Marvell Nanofabrication Laboratory Dow Chemical OiR[removed] Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2014-09-10 19:13:50 Photoresist Resist Dow Chemical Company Chemistry Polymers Materials science
218	Marvell NanoLab Member login Lab Manual Contents Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2013-05-02 01:28:49 Optical materials Etching Wafer Silicon dioxide Poly Silicon Quartz Fused quartz Resist Chemistry Semiconductor device fabrication Materials science
219	Chapter 4.5 Miscellaneous Spin-Coat Processes Miscellaneous Spin-Coat Materials at the Marvell Nanofabrication Laboratory MicroChem LOR - 5A Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2014-08-21 13:38:15 Rinse Technology Semiconductor device fabrication Resist Spin coating
220	Marvell NanoLab Member login Lab Manual Contents Add to Reading List Source URL: nanolab.berkeley.edu Language: English - Date: 2014-08-19 10:07:02 Stepper Microtechnology Physics Reticle Photomask Telescopic sight Microelectromechanical systems Wafer Angular mil Materials science Semiconductor device fabrication Technology