Marvell NanoLab Member login Lab Manual Contents

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Date: 2014-08-28 15:42:25 Technology Spin coating Etching Plasma ashing Photoresist Wafer Resist Microelectromechanical systems Photolithography Semiconductor device fabrication Materials science Microtechnology		Marvell NanoLab Member login Lab Manual Contents Add to Reading List Source URL: nanolab.berkeley.edu Download Document from Source Website File Size: 995,29 KB Share Document on Facebook

	Cover Picture: An Epoxy Photoresist Modified by Luminescent Nanocrystals for the Fabrication of 3D High-Aspect-Ratio Microstructures (Adv. Funct. Mater) DocID: 1rAvn - View Document
	Heat Load Experiments at CAMD and CLS D. Yemane1, S. Achenbach2, J. Goettert1, R. Guntaka3, D. Haluzan2, K. Nandakumar3, V. Singh1, V. Subramanian2, G. Wells2 1 LSU Center for Advanced Microstructures and Devices (CAMD), DocID: 1rdcU - View Document
	Journal of Photochemistry and Photobiology A: Chemistry–154 Nanopatterning with conformable phase masks Joana Maria a , Seokwoo Jeon a , John A. Rogers a,b,∗ a DocID: 1r33C - View Document
	APPLIED PHYSICS LETTERS 92, 173115 共2008兲 Patterning of single walled carbon nanotubes using a low-fluence excimer laser photoablation process Junghun Chae,1 Xinning Ho,2 John A. Rogers,2,3 and Kanti Jain1,a兲 1 DocID: 1qXkV - View Document
	Interface mechanics of adhesiveless microtransfer printing processes H.-J. Kim-Lee, A. Carlson, D. S. Grierson, J. A. Rogers, and K. T. Turner Citation: Journal of Applied Physics 115, ); doi: DocID: 1qW6E - View Document