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Microtechnology / Optical proximity correction / Resolution enhancement technologies / 65 nanometer / Mask data preparation / Physical design / Design closure / Photolithography / Photomask / Electronic engineering / Electronic design automation / Materials science


J. Micro/Nanolith. MEMS MOEMS 6共3兲, 031005 共Jul–Sep 2007兲 Performance-driven optical proximity correction for mask cost reduction Puneet Gupta Blaze DFM, Incorporated
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Document Date: 2010-08-13 22:34:31


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City

Orleans Drive Sunnyvale / Monterey / Wilsonville / Sunnyvale / San Diego / Mountain View / San Jose / /

Company

IBM / Puneet Gupta Blaze DFM Incorporated / Mentor Graphics Corp. / TSMC / Special Interest Group / Dupont / Synopsys / Faculty Award / Blaze DFM Incorporated / Research Corporation / Intel / Advanced Micro Devices / /

Country

United States / China / /

Currency

USD / /

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EntertainmentAwardEvent

the Vulcans Education Excellence Award / the University of Michigan Henry Russel Award / /

Event

Man-Made Disaster / /

Facility

National University of Singapore / Library Characterization We / Andrew B. Kahng University of California / Dennis Sylvester Jie Yang University of Michigan Department / University of Michigan Henry Russel Award / Indian Institute of Technology / Peking University / College of Engineering / Harvard College / University of Michigan / University of California / /

IndustryTerm

sub-wavelength manufacturing / technology scales / exposure tools / slack budgeting algorithm / faster devices / insertion tool / possible solution / semiconductor manufacturing / corner-case timing analysis tools / law cost / mathematical-programming-based slack budgeting algorithm / lithography technologies / zero-slack algorithm / technology scaling / point yield bonding algorithm / statistical timing analysis tools / manufacturing / e-beam / technology node / maximal-independent-set based algorithm / insertion tools / /

OperatingSystem

Linux / /

Organization

New Faculty / Cadence Silicon Ensemble / University of California / University of Michigan / Ann Arbor / National Science Foundation / National University of Singapore / U.S. Securities and Exchange Commission / University of Michigan Department of Electrical Engineering and Computer Science / Harvard College / Peking University / Beijing / UCSD / Association for Computing Machinery / Society of Photo / Department of Electrical and Computer Engineering / Indian Institute of Technology / Delhi / College of Engineering / IBM Faculty / University of California / San Diego Department of Computer Science and Engineering / the University of Michigan / performed using Cadence Silicon Ensemble / /

Person

Jie Yang / Beatrice Winner / Dennis Sylvester / Andrew B. Kahng / Dennis Sylvester Jie / /

Position

layout editor / representative of data volume changes / small driver / cofounder and product architect / associate professor of electrical engineering and computer science / writer / professor of computer science / visiting associate professor / associate professor of electrical engineering / COO / visiting associate professor of electrical and computer engineering / /

Product

EPEMinCorr / /

ProvinceOrState

Michigan / California / /

Technology

semiconductor / 1 Introduction Continued technology / Linux / mathematical-programming-based slack budgeting algorithm / zero-slack algorithm / selling point yield bonding algorithm / lithography / integrated circuits / slack budgeting algorithm / 130-nm technology / CMP / MEMS / 2005 2007 2010 2013 Technology / lithography technologies / http / fracturing / simulation / CAD / /

URL

http /

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