GLOBALFOUNDRIES Inc. / Micron Technology Inc. / Tela Innovations Inc. / RAVE LLC / EBARA Corp. / SAMSUNG Electronics Co. Ltd. / Xilinx Inc. (United States) As / CHAIR Naoya Hayashi Dai Nippon Printing Co. Ltd. / Energie GmbH / JCMwave GmbH / Canon Technologies Inc. / Canon Inc. / Applied Materials Inc. / Carl Zeiss SMS GmbH / ASML Netherlands B.V. / SMS GmbH / Hitachi High-Tech Science Corp. / DNP Photomask Europe S.p.A. / Simmons / IBM Corp. / Republic / Photronics Inc. / Keysight Technologies INC. / Mentor Graphics (India) Pvt. Ltd. / KLA-Tencor Inc. / Mentor Graphics Corp. / SHARP / EUV / Infineon Technologies AG / Matsuda / Cypress Semiconductor Corp. / ASML US INC. / Oracle / HOYA Corp. USA / Shibaura Mechatronics Corp. / Sequoia Design Systems Inc. / Intel Corp. / Nikon Precision Inc. / Shin-Etsu MicroSi Inc. / CyberOptics Corp. / SK Hynix Inc. / Lawrence Berkeley National Laboratory / Tokyo Electron Ltd. / Plasma-Therm LLC / GLOBALFOUNDRIES Singapore / George S. A. / Synopsys Inc. / Toppan Photomasks Inc. / Dai Nippon Printing Co. Ltd. / D2S Inc. / GLOBALFOUNDRIES Inc. (United States) As / /
Country
Japan / Korea / Germany / United States / /
Currency
USD / / /
Facility
College of Nanoscale Sciences / Technology SUMMARIEs WWW.SPIE.ORG/PM Monterey Conference Center / /
International Society for Optics and Photonics / Bacus Steering committee / Univ. of Texas / /
Person
Mohammed Harb / Kazuki Nakazawa / Michael D. Archuletta / Frank Scholze / Thomas Trautzsch / Ute Buttgereit / Oliver Kienzle / Jon Haines / Gilda Garreton / Brian J. Grenon / M. Warren Montgomery / Hesham Abdelghany / Hirotsugu Ita / Takeshi Murakami / Daniel L. Rost / Peter D. Buck / Mark Jee / William Wilkinson / Jung-Uk Seo / Paul C. Allen / Masahiro Hatakeyama / David Z. Pan / Osamu Matsuda / Xin Wu / Susumu Iida / Jan Wernecke / Patrick P. Naulleau / Hans Pan / Gary Meyers / Markus P. Benk / Michael Krumrey / Hiroyuki Miyashita / Koichi Kanno / Wilbert Odisho / Tsuneo Terasawa / Thomas B. Faure / Kenji Terao / Paul W. Ackmann / Munenori Iwami / Ingo Bork / Yoshihisa Kase / Jim N Wiley / Robert C. Pack / Max Schoengen / Fred Bijkerk / Tomoaki Yoshimori / Kenneth A. Goldberg / Tomokazu Kozakai / Wilhelm Maurer / Mark Pereira / Andrew R. Neureuther / Tsuyoshi Amano / Fumio Aramaki / Tsukasa Abe / Todd Lukanc / Christian Bürgel / Keun-Young Kim / Jan Pomplun / Larry S. Zurbrick / Benny Wang / Brian Cha / Min-Ho Kim / Toshiyuki Hisamura / Artur Balasinski / Bei Yu / Gary Zhang / Emmanuel Rausa / Bo Su / Hiroki Shirahama / Ping Zhang / Sriram Madhavan / Makoto Muto / Erwin Zoethout / Ryoichi Hirano / Fadi Batarseh / Abbas Rastegar / Rob Ronald / Michael C. Smayling / Patrick M. Martin / Qingwei Liu / Sven Burger / Alexander Wei / Keith P. Standiford / Koji Mikami / Anton Haase / Dong-Hoon Chung / Michael T. Postek / Aki Fujimura / Dan Meier / Glenn R. Dickey / Sarah McGowan / Lippincott / Yoshie Okamoto / Lawrence Berkeley / Yeon-Ah Shim / Bryan S. Kasprowicz / Martin van den Brink / Guojie Cheng / Jonathan Chang / Rene A. Claus / Koichiro Tsujita / Walter Chan / Yun Wu / Joanne Wu / Tom Boettiger / Uwe F. W. Behringer / Laura Waller / Hye-Sung Lee / Chris J. Lee II / Shoji Yoshikawa / Victor Soltwisch / Frank Abboud / Jae-Young Choi / / /
Position
G.P. / Prime Minister / spie.org/pm / Hybrid OPC technique using model / PHOTOMASK TECHNOLOGY• Technology SUMMARIEs WWW.SPIE.ORG/PM / Symposium CHAIR / designer / Major / Symposium Co-Chair / MP / VSB mask writer / writer / /
Conference 9235: Photomask Technology[removed]CONNECTING MINDS. ADVANCING LIGHT. 20