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Chemical kinetics / Semiconductor device fabrication / Ceramic materials / Coatings / Chemical vapor infiltration / Chemical vapor deposition / Synthetic membrane / Adsorption / Catalysis / Chemistry / Physical chemistry / Thin film deposition


PII: [removed]85010-U
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Document Date: 2011-08-28 14:43:09


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File Size: 1,33 MB

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Company

I Pergamon Press plc / Knudsen / /

Country

Netherlands / United Kingdom / /

Currency

USD / /

Facility

Laboratory of Inorganic Chemistry / University of Twente / University of Cincinnati / /

IndustryTerm

carrier gas / manufacturing industries / deposited solid product / desired solid product / iteration algorithm / multi-component gas system / simplified dusty-gas model / dusty-gas model / approximate solution / modified mass action law / chemical vapour deposition / gaseous reaction products / porous media / chemical &pour infiltration / chemical reaction / gas diffusion r&e / chemical / difficult processing problems / chemical vapor infiltration / porous substrate media / gas separation / ceramic membrane systems / energy / /

Organization

University of Twente / PI PO / University of Cincinnati / Cincinnati / Department of Chemical Engineering / Laboratory of Inorganic Chemistry / Materials Science and Catalysis / Department of Chemical Technology / /

Position

RT / /

ProvinceOrState

Ohio / Wisconsin / British Columbia / /

PublishedMedium

Inorganic Chemistry / /

Technology

CVD system / iteration algorithm / simulation / fuel cells / CVD / /

SocialTag