Dry Etch and Plasma System 1. Scope 1.1 This document provides operating procedures and requirements to etch silicon or silica with gas plasma system. - Materials science - Document - PDFSEARCH.IO

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	Dry Etch and Plasma System 1. Scope 1.1 This document provides operating procedures and requirements to etch silicon or silica with gas plasma system. Add to Reading List Document Date: 2015-05-06 04:34:43 Open Document File Size: 938,11 KB Share Result on Facebook Currency CHF / / IndustryTerm reaction gas / gas plasma system / / Person Tang / / ProvinceOrState Ontario / / SocialTag Visual arts Microtechnology Technology Plasma processing Plasma Isotropic etching Industrial etching Silicon dioxide Glass etching Semiconductor device fabrication

Dry Etch and Plasma System 1. Scope 1.1 This document provides operating procedures and requirements to etch silicon or silica with gas plasma system.Add to Reading List