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Ultraviolet / Physics / Immersion lithography / Extreme ultraviolet lithography / Photolithography / Extreme ultraviolet


T403-medea[removed]:47
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Document Date: 2009-03-25 10:37:12

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File Size: 88,19 KB

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City

France Germany The / /

Company

LITHOGRAPHY Partners / ASML / SAGEM / Esprit / CSC / /

Continent

Europe / /

Country

Japan / United States / /

Currency

EUR / /

/

/

IndustryTerm

tive coating technology / multilayer coating technology / masks alpha tool / alpha tool / nm chips / mask equipment / replacement technologies / system electronics / lithographic equipment / enhancement technologies / main candidate technology / high technology electronics / optical systems / exposure tool / chip manufacturing costs / /

Organization

Information Society / MEDEA+ Office / European Commission / /

Person

Hans Meiling / /

/

Position

leader / Xenocs Project leader / illuminator / co-operative / optics specialist / /

ProgrammingLanguage

NGL / /

PublishedMedium

the Information Society / /

SportsEvent

EPL / /

Technology

semiconductor / alpha / replacement technologies / 70 nm chips / tive coating technology / photolithography / integrated circuits / multilayer coating technology / enhancement technologies / Integrated circuit / main candidate technology / NGL technologies / /

URL

http /

SocialTag