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Extreme ultraviolet / Ultraviolet / Next-generation lithography / Physics / Extreme ultraviolet lithography / Microtechnology / Photolithography


T404-medea+ (LO1[removed]:14
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Document Date: 2009-03-25 10:37:13


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File Size: 88,80 KB

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City

Stuttgart / France Germany The / /

Company

LITHOGRAPHY Partners / Alcatel / Infineon Technologies / Sagem / Philips / ESPRIT / /

Continent

Europe / /

Country

United States / /

Currency

EUR / /

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IndustryTerm

consortium energy photons / electronics indus / final products / mask-making technology / technology roadmap / industrial solutions / transportation procedures / exposure tool / defect-free multilayer mirror blank processing / process meeting mask specifications tools / /

Organization

Information Society / MEDEA+ Office / European Commission / /

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Position

leader / conductor / Schott Glas Schott Lithotec SESO Sopra Uni Marseille Xenocs Project leader / co-operative / /

PublishedMedium

the Information Society / /

Technology

semiconductor / mask-making technology / Untried technologies / simulation / key enabling technology / integrated circuit / /

URL

http /

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