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Metal gate
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#	Item
1	Intel's High-K/Metal Gate Announcement Add to Reading List Source URL: www.ecma-international.org Language: English - Date: 2014-10-28 05:19:20
2	Intel's High-K/Metal Gate Announcement Add to Reading List Source URL: www.ecma-international.org Language: English - Date: 2014-10-28 05:20:27
3	April19,2016 GOLDEN GATE BRIDGE PHYSICAL SUICIDE DETERRENT SYSTEM FEDERAL-AID PROJECT: BHLSand WIND RETROFIT Add to Reading List Source URL: goldengate.org Language: English - Date: 2016-04-19 19:12:57 Real estate Construction Engineering Piping Plumbing Metal fabrication Flange General contractor Construction (Design and Management) Regulations Contract
4	Intel's High-K/Metal Gate Announcement Add to Reading List Source URL: www.ecma.ch Language: English - Date: 2014-10-28 05:20:27
5	Intel's High-K/Metal Gate Announcement Add to Reading List Source URL: www.ecma.ch Language: English - Date: 2014-10-28 05:19:20
6	SISPAD 2012, September 5-7, 2012, Denver, CO, USA 3D Simulation Study of Work-Function Variability in a 25 nm Metal-Gate FinFET with Curved Geometry using Voronoi Grains G. Indalecio and A.J. Garc´ıa-Loureiro Add to Reading List Source URL: in4.iue.tuwien.ac.at Language: English - Date: 2013-02-12 08:39:11
7	Microsoft PowerPoint - Metal Gate Transistor Process Flow.ppt [Compatibility Mode] Add to Reading List Source URL: www.nano.iisc.ernet.in - Date: 2010-08-23 00:22:11
8	J. Sens. Sens. Syst., 4, 1–8, 2015 www.j-sens-sens-syst.netdoi:jsss © Author(sCC Attribution 3.0 License. Catalytic metal-gate field effect transistors based on SiC Add to Reading List Source URL: liu.diva-portal.org Language: English - Date: 2015-01-15 04:52:34
9	Intel's High-K/Metal Gate Announcement Add to Reading List Source URL: ecma-international.org Language: English - Date: 2014-10-28 05:19:20 Computing Ecma International Reference Digital Data Storage Digital Tape Format Graphics file formats Universal 3D Standards organizations
10	Photon Factory Activity Report 2009 #27 Part BSurface and Interface 2C/2008S2003 Interfacial reactions for Ru metal-electrode/HfSiON gate stack structures studied Add to Reading List Source URL: pfwww.kek.jp Language: English - Date: 2010-12-27 22:22:07 Semiconductor device fabrication Superhard materials Transistors Ceramic materials Atomic layer deposition High-k dielectric Ruthenium(IV) oxide Silicon dioxide Titanium nitride Chemistry Matter Electronic engineering