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Radiation / Electromagnetic spectrum / Extreme ultraviolet lithography / Optical coating / Monochromator / Extreme ultraviolet / Ultraviolet / Next-generation lithography / X-ray / Electromagnetic radiation / Physics / Spectroscopy


INSTITUTE OF PHYSICS PUBLISHING METROLOGIA Metrologia[removed]S229–S232
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Document Date: 2010-08-18 08:54:34

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File Size: 109,81 KB

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City

New York / /

Company

IOP Publishing Ltd / /

Currency

USD / /

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Facility

S232 Facility / National Institute of Standards and Technology / INSTITUTE OF PHYSICS PUBLISHING METROLOGIA Metrologia / /

IndustryTerm

beam energy / lithography tools / gas cell / alpha-class tool / /

Organization

National Institute of Standards and Technology / INSTITUTE OF PHYSICS PUBLISHING METROLOGIA Metrologia / /

ProvinceOrState

Maryland / /

Technology

semiconductor / alpha / radiation / laser / lithography / X-ray / done using an external laser / /

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