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Thin film deposition / Semiconductor device fabrication / Atomic layer deposition / Matter / Manufacturing / Chemistry / Thin film / ALD / Vacuum deposition


Journal of Undergraduate Research 3, Atomic Layer Deposited Al2 O3 Film on Si(100) as Buffer Layer for Hfx Ti1−x O2 Deposition Adam L. Kueltzo Thornton Fractional North High School, Calumet City, IL 60409
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Document Date: 2009-11-24 11:31:03


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File Size: 651,66 KB

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