![Physics / Thin film deposition / Crystallography / Crystals / Spectroscopy / Reflection high-energy electron diffraction / Epitaxy / Molecular beam epitaxy / Lattice constant / Diffraction / Chemistry / Scientific method Physics / Thin film deposition / Crystallography / Crystals / Spectroscopy / Reflection high-energy electron diffraction / Epitaxy / Molecular beam epitaxy / Lattice constant / Diffraction / Chemistry / Scientific method](https://www.pdfsearch.io/img/92d13fd17c9da176f1060568718c536a.jpg)
| Document Date: 2014-11-20 04:17:28 Open Document File Size: 976,46 KBShare Result on Facebook
City Berlin / D10117 / / Company Huang KG / Creative Commons / / Country Germany / / / EntertainmentAwardEvent the SiCaF / / IndustryTerm k gate dielectric applications / reflection high-energy electron diffraction / metal-oxidesemiconductor technology / high-energy electron diffraction / e-beam / rare-earth metal oxides / energy / metal oxide semiconductor field-effect transistor technology / / Movie ML 3 / ML / ML 2 / ML 6 / / MusicGroup X-ray / / Organization Paul-Drude-Institut für Festkörperelektronik / / Person Michael Niehle / Vladimir M Kaganer / Oliver Bierwagen / Michael Hanke / / ProgrammingLanguage ML / / ProvinceOrState Minnesota / / RadioStation Sergent AM / / Technology crystallization / X-ray / metal-oxidesemiconductor technology / metal oxide semiconductor field-effect transistor technology / dielectric / / URL http /
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