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Physics / Thin film deposition / Crystallography / Crystals / Spectroscopy / Reflection high-energy electron diffraction / Epitaxy / Molecular beam epitaxy / Lattice constant / Diffraction / Chemistry / Scientific method


Hanke et al. Nanoscale Research Letters 2012, 7:203 http://www.nanoscalereslett.com/contentNANO EXPRESS Open Access
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Document Date: 2014-11-20 04:17:28


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Berlin / D10117 / /

Company

Huang KG / Creative Commons / /

Country

Germany / /

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the SiCaF / /

IndustryTerm

k gate dielectric applications / reflection high-energy electron diffraction / metal-oxidesemiconductor technology / high-energy electron diffraction / e-beam / rare-earth metal oxides / energy / metal oxide semiconductor field-effect transistor technology / /

Movie

ML 3 / ML / ML 2 / ML 6 / /

MusicGroup

X-ray / /

Organization

Paul-Drude-Institut für Festkörperelektronik / /

Person

Michael Niehle / Vladimir M Kaganer / Oliver Bierwagen / Michael Hanke / /

ProgrammingLanguage

ML / /

ProvinceOrState

Minnesota / /

RadioStation

Sergent AM / /

Technology

crystallization / X-ray / metal-oxidesemiconductor technology / metal oxide semiconductor field-effect transistor technology / dielectric / /

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