Sub-10nm HP Patterning using EUV based Self-Aligned Double Patterning (P46) Sushil Padiyar - Multiple patterning - Document - PDFSEARCH.IO

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	Sub-10nm HP Patterning using EUV based Self-Aligned Double Patterning (P46) Sushil Padiyar Add to Reading List Document Date: 2013-07-08 00:26:40 Open Document File Size: 626,77 KB Share Result on Facebook Company Applied Materials / Intel / Samsung / Toshiba / HP / / Currency pence / / Position Dipole 50nm Resist Thx FIRM Rinse AMAT Mesa Etch AMAT Producer / / Technology Flash / Lithography / / SocialTag Sizing Multiple patterning Extreme ultraviolet lithography Extreme ultraviolet

Sub-10nm HP Patterning using EUV based Self-Aligned Double Patterning (P46) Sushil PadiyarAdd to Reading List