Dresden / Greensboro / San Jose / Austin Anthony Yen / Metrology / /
Company
GLOBALFOUNDRIES Inc. / Lasertec U.S.A. Inc. / Nanopatterning - Alternative Lithographic Technologies / Nikon Research Corp. / Lincoln Laboratory / SAMSUNG Electronics Co. Ltd. / Nova Measuring Instruments Inc. (USA) / JSR Micro Inc. (USA) / Advanced Micro Devices Inc. / Gigaphoton Inc. / Vistec Electron Beam Lithography Group / Toppan Printing Co. Ltd. / Applied Materials Inc. (USA) / Micron Technology Inc. (USA) / Carl Zeiss SMS GmbH / Applied Materials Inc. / ASML Netherlands B.V. / Shin-Etsu Chemical Co. Ltd. / IBM Corp. / Hitachi HighTechnologies Corp. / Hewlett-Packard Labs / Ushio Inc. / Photronics Inc. / Brewer Science Inc. (USA) / GLOBALFOUNDRIES Inc. (USA) / Tokyo Ohka Kogyo Co. Ltd. / Mentor Graphics Corp. / FEI Co. / HOYA Corp. / Nanometrology International Inc. (USA) / Infineon Technologies AG / Texas Instruments Inc. (USA) / ASML Brion Technologies / ASML US Inc. / Canon Nanotechnologies Inc. / IMS Nanofabrication AG / Photronics Inc. (USA) / Taiwan Semiconductor Manufacturing Co. Ltd. / Ultratech / Intel Corp. / I&I Consulting / SK Hynix Inc. / Nanometrics Inc. (USA) / KLA-Tencor Corp. / Canon Nanotechnologies Inc. (USA) / FUJIFILM Electronic Materials U.S.A. Inc. (USA) / SEMATECH Inc. (USA) / AZ Electronic Materials USA Corp. / KLATencor Corp. / Toshiba Corp. / Dai Nippon Printing Co. Ltd. / Sony Corp. / Tokyo Electron America Inc. (USA) / Cymer Inc. (USA) / ASML Taiwan Ltd. / Advanced Micro Devices Inc. (USA) / /
Country
Switzerland / France / Japan / Korea / United Kingdom / Israel / Germany / Belgium / Austria / United States / / /
Facility
College of Nanoscale Science / San Jose Convention Center / Hiroshi Ito Memorial / Fraunhofer Institute / National Institute of Standards and Technology / Fraunhofer Institute of Integrated Systems / Industrial Technology Research Institute / Georgia Institute of Technology / Rochester Institute / Rochester Institute of Technology John L. Sturtevant / /
IndustryTerm
template processing / nm technology / chemical and physical principles / reference measurement systems / technological infrastructure / stateof-the-art lithographic tools / metrology tools / lithographic and patterning technology / technology development / reticle handling solutions / lithographic imaging solutions / patterned media / technology areas / technology groups / defect tolerant computing / software suppliers / manufacturing / e-beam / technology developments / reduced manufacturing costs / defect management / materials technology / lithography technology improvements / lithographic technologies / high deprotection activation energy photoresist / manufacturing ready / droplet-on-demand inkjet printing / microlithographic technology / technology nodes / dip-pen printing / source technologies / patterning solutions / random-logic applications / related energy applications / technology learning / /
Organization
Rochester Institute of Technology / Technische Univ. / College of Nanoscale Science & Engineering / Cornell Univ. / National Institute of Standards and Technology / Texas A&M Univ. / Paul Scherrer Institut / Univ. of Pennsylvania / Industrial Technology Research Institute / Univ. of Chicago / Fraunhofer Institute for Photonic Microsystems IPMS / MIT / Univ. of California / Fraunhofer Institute for Photonic Microsystems Kafai Lai / Univ. of Texas / Univ. of Southern California / Univ. of North Carolina / Colorado State Univ. / Queen Mary Univ. of London / Georgia Institute of Technology / Univ. of Massachusetts Amherst / Fraunhofer Institute of Integrated Systems / Lawrence Berkeley National Lab. / Mary Univ. of London / /
Person
Roel Gronheid / Corrie Clark / Julien Mailfert / Jing Jiang / Masaki Yoshioka / Robert L. Brainard / Brian Routh / Ivo W. Rangelow / Michael A. Guillorn / William H. Arnold / Harry J. Levinson / Ralph R. Dammel / Dirk J. Broer / Jorge J. Rocca / Masafumi Asano / Kristin De Meyer / Daniel P. Sanders / Yoshio Kawai / Costas J. Spanos / John C. Robinson / Bruno La Fontaine / Todd R. Younkin / Anna Lio / Anna Tchikoulaeva / Corey Senowitz / Martha I. Sanchez / Chris A. Mack / Luigi Capodieci / Thomas J. Watson / Shinji Okazaki / Alok Vaid / Christopher J. Raymond / Mary Univ / Timothy F. Crimmins / John A. Allgair / Kang-Hoon Choi / Patrick P. Naulleau / Frank Goodwin / Peter De Bisschop / Nobuyuki N. Matsuzawa / Emile A. Schweikert / Markus Bender / Jan Hendrik Peters / Joy Y. Cheng / Michael Goldstein / Robert D. Allen / Alek C. Chen / Christopher K. Ober / Gavin Dutrow / Daniel J. C. Herr / Mircea V. Dusa / Wilhelm Maurer / Michael O. Thompson / Stanislav V. Verkhoturov / Karen L. Wooley / Jeff Blackwood / Luisa D. Bozano / Kevin T. Turner / Hans Loeschner / Obert R. Wood II / Scott W. Jessen / Daniel A. Corliss / Pavel Plachinda / Katja Steidel / Kenneth R. Carter / Christopher Bencher / Christopher J. Progler / Kurt G. Ronse / Timothy A. Brunner / Johann W. Bartha / C. Grant Willson / Laurent Pain / Eric M. Panning / Tsutomu Shoki / Guorong Sun / Michael Strauss / Frank E. Abboud / Adriana Pavía / Ming Ke / Sean D. Burns / Paul Scherrer / James W. Thackeray / Peter Trefonas / John L. Sturtevant / Ofer Adan / Uzodinma Okoroanyanwu / Sebastian U. Engelmann / Mircea V. Dusa Bruce / Mark H. Somervell / Michael T. Postek / Elizabeth A. Dobisz / Eric Solecky / Thomas Verduin / Clifford L. Henderson / Marco J. Wieland / Andreas Erdmann / Cornelis W. Hagen / Benjamin D. Bunday / Michael J. Eller / Wei Wu / Emily E. Gallagher / Ted Liang / Lawrence Berkeley / Jay Lin / Bryan S. Kasprowicz / Bruce W. Smith / Douglas Guerrero / Helmut Schift / Douglas J. Resnick / Christopher S. Ngai / Frank M. Schellenberg / Jos P. Benschop / Pieter Kruit / Van de Kerkhove / Ricardo Ruiz / Shunsuke Koshihara / Matthew J. Sendelbach / Alan D. Brodie / Michael J. Lercel / OU NN AA EI V V / / /
Position
advisor / General / leading author / Author / Conference Co-Chair / Executive / principal author / Consultant / co-CHAIR / Conference Chair / /
ProgrammingLanguage
NIL / /
ProvinceOrState
Southern California / California / Georgia / Colorado / Texas / Pennsylvania / North Carolina / /
CONNECTING MINDS. ADVANCING LIGHT. FFO N