![Microtechnology / Extreme ultraviolet lithography / Extreme ultraviolet / Photolithography / Multiple patterning / Photomask / Semiconductor device fabrication / Ultraviolet / Abstract State Machine Language / Materials science / Technology / Electromagnetic radiation Microtechnology / Extreme ultraviolet lithography / Extreme ultraviolet / Photolithography / Multiple patterning / Photomask / Semiconductor device fabrication / Ultraviolet / Abstract State Machine Language / Materials science / Technology / Electromagnetic radiation](https://www.pdfsearch.io/img/f969ea1602eb9e201790655721842f1c.jpg)
| Document Date: 2014-08-15 04:24:00 Open Document File Size: 561,55 KBShare Result on Facebook
City Zurich / Veldhoven / San Diego / / Company ASML / Cymer LLC / MICROmanufacturing / Adlyte Corp. / / Country Netherlands / / / Event M&A / / Facility Temple University / Swiss Federal Institute of Technology / Zurich The Swiss Federal Institute of Technology / University of Pennsylvania / / IndustryTerm conventional equipment / light-source technology / inspection technology / wafer-production systems / increase manufacturing time / lithography equipment / printing thousands / high-energy tin particles / semiconductor manufacturing equipment / photolithography equipment / energy / / Organization Temple University / Swiss Federal Institute of Technology / the University of Pennsylvania / / Person Ryan Young / William Leventon / Reza Abhari / Nigel Farrar / / / Position author / head of the ETHZ research team / spokesman / collector / vice president of marketing / The Quality Leader / Contributing Editor / / ProvinceOrState Pennsylvania / / Technology semiconductor / laser / inspection technology / lithography system / light-source technology / lithography / photolithography / / URL www.HeuleTool.com / /
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