Back to Results
First PageMeta Content
Microtechnology / Extreme ultraviolet lithography / Extreme ultraviolet / Photolithography / Multiple patterning / Photomask / Semiconductor device fabrication / Ultraviolet / Abstract State Machine Language / Materials science / Technology / Electromagnetic radiation


Microsoft PowerPoint - ad-fieldingmfg[removed]Compatibility Mode]
Add to Reading List

Document Date: 2014-08-15 04:24:00


Open Document

File Size: 561,55 KB

Share Result on Facebook

City

Zurich / Veldhoven / San Diego / /

Company

ASML / Cymer LLC / MICROmanufacturing / Adlyte Corp. / /

Country

Netherlands / /

/

Event

M&A / /

Facility

Temple University / Swiss Federal Institute of Technology / Zurich The Swiss Federal Institute of Technology / University of Pennsylvania / /

IndustryTerm

conventional equipment / light-source technology / inspection technology / wafer-production systems / increase manufacturing time / lithography equipment / printing thousands / high-energy tin particles / semiconductor manufacturing equipment / photolithography equipment / energy / /

Organization

Temple University / Swiss Federal Institute of Technology / the University of Pennsylvania / /

Person

Ryan Young / William Leventon / Reza Abhari / Nigel Farrar / /

/

Position

author / head of the ETHZ research team / spokesman / collector / vice president of marketing / The Quality Leader / Contributing Editor / /

ProvinceOrState

Pennsylvania / /

Technology

semiconductor / laser / inspection technology / lithography system / light-source technology / lithography / photolithography / /

URL

www.HeuleTool.com / /

SocialTag