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Multiple patterning / Photomask / EBeam


ROLE OF MASK IN COST AND CAPABILITY DYNAMICS FOR SUB 14NM PATTERNING GSA SUPPLY CHAIN WORKING GROUP BRYAN KASPROWICZ
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Document Date: 2014-08-22 15:55:17


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File Size: 1,63 MB

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Company

NVIDIA / Photronics / /

Position

Confidential IC MASK TECHNOLOGY DRIVER / /

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