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The Mask / SPIE / Photomask / Extreme ultraviolet lithography / Multiple patterning / Photolithography / Mask inspection / Mask shop / KLA Tencor / Materials science / Microtechnology / Technology


Document Date: 2015-04-01 16:45:15

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City

Monterey Marriott Monterey / /

Company

GLOBALFOUNDRIES Inc. / Lasertec U.S.A. Inc. / Allen Toppan Photomasks Inc. / RAVE LLC / America Thomas Struck Infineon Technologies AG / EBARA Corp. / JEOL USA Inc. / SAMSUNG Electronics Co. Ltd. / Patrick M. Martin Applied Materials Inc. / NuFlare Technology Inc. / Applied Matierials Ltd. / Bryan S. Kasprowicz Photronics Inc. / Tec-Start Consulting / Emerging Mask Technologies / Mentor Graphics GmbH / Bryan S. Kasprowicz Photronics Inc. As / Carl Zeiss SMS GmbH / Applied Materials Inc. / KLA-Tencor Idaho / Brian Cha Samsung Electronics Co. Ltd. / Hitachi High-Tech Science Corp. / Jacek K. Tyminski Nikon Research Corp. / IBM Corp. / SUSS MicroTec Inc. / Artur Balasinski Cypress Semiconductor Corp. / Jim N. Wiley ASML US Inc. / BACUS Steering Committee Frank Abboud Intel Corp. / Photronics Inc. / SEMATECH Inc. / Mentor Graphics Corp. / Microelectronics Peter D. Buck Mentor Graphics Corp. / Michael D. Archuletta RAVE LLC / Monterey SPIE Photomask Technology / Grenon Grenon Consulting Jon Haines Micron Technology Inc. / Wilbert Odisho KLA-Tencor Inc. / Matsuda / ASML US Inc. / Naoya Hayashi Dai Nippon Printing Co. Ltd. / Symposium Co-Chair Bala Thumma Synopsys Inc. / Monterey! Mark Jee HOYA Corp. / Taiwan Semiconductor Manufacturing Co. Ltd. / Google / Intel Corp. / Applied Materials Ltd. / Paul Ackmann GLOBALFOUNDRIES Inc. / Larry S. Zurbrick Keysight Technologies Inc. / Dai Nippon Printing Co. Ltd. / Thomas B. Faure IBM Corp. / D2S Inc. / Michael Watt Shin-Etsu MicroSi Inc. / EUV Infrastructure / /

Country

Japan / Korea / Germany / Belgium / United States / /

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Facility

Mark Jee HOYA Corp. USA M. Warren Montgomery College of Nanoscale Sciences / pm15call Monterey Conference Center / SPIE Digital Library / LOCATION Monterey Conference Center / SUNY College of Nanoscale Science / Hotel SPIE / Monterey Conference Center / /

IndustryTerm

wafer technology / mask infrastructure / mask shop management / mask manufacturing / mask management / data processing / sub20nm devices / e-beam / inverse lithography technology / manufacturing control / mask technologies / mask solutions / shop management / manufacturing insertion / /

Organization

Bay Area Chrome User Society / Program Committee / National Institute of Standards and Technology / BACUS Prize / SUNY College / Department of Defense / Mark Jee HOYA Corp. USA M. Warren Montgomery College of Nanoscale Sciences & Engineering / /

Person

Yong Kang / James N. Wiley / Alexander Chereshnya / M. Warren Montgomery / Takeshi Murakami / Peter D. Buck / Steffen F. Schulze / Anna Tchikoulaeva / Martha I. Sanchez / Masahiro Hatakeyama / Douglas J. Resnick Canon Nanotechnologies / Osamu Matsuda / Susumu Iida / Tsuneo Terasawa / Russell B. Cinque / Kenji Terao / Ingo Bork / Lucien Bouchard / Stefan Wurm / Uwe Mueller / Tomokazu Kozakai / Dong Hoon Chung / Uwe Dietze / Tsuyoshi Amano / Luisa D. Bozano / Fumio Aramaki / Emmanuel Rausa / Linda K. Sundberg / Ryoichi Hirano / Frank E. Abboud / Abbas Rastegar / Mark M. Wylie / Hong Yul Jung / Dan Meisburger / Amy E. Zweber / Chung Ki Lyu / Aki Fujimura / Rik Jonckheere / Emily E. Gallagher / Lin Wang / Jay Lin / Ron R. Bozak / Yoshihiro Tezuka / Sang-Hoon Han / Uwe F. W. Behringer / Shoji Yoshikawa / Hiroyuki Miyashita / Koichi Kanno / /

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Position

The contact author / AUTHOR / Consultant / contractor in the USA / Conference Chair/ Editor / Executive Strategist / Chair / /

ProgrammingLanguage

NIL / ML / /

ProvinceOrState

California / /

PublishedMedium

Proceedings of SPIE / /

Technology

inverse lithography technology / photolithography / 8 SPIE Photomask Technology / MEMS / 1 360 676 3290 6 SPIE Photomask Technology / wafer technology / semiconductor / lithography / 2015 Photomask Technology / 2015 4 SPIE Photomask Technology / Alternative mask technologies / 2015 TECHNOLOGIES / Simulation / /

URL

www.SPIEDigitalLibrary.org / www.spie.org/pm15call / www.spie.org/sg15call / /

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