![Computational lithography / Extreme ultraviolet lithography / Multiple patterning / Photolithography / Immersion lithography / Optical proximity correction / Resist / Lithography / Electron beam lithography / Microtechnology / Materials science / Technology Computational lithography / Extreme ultraviolet lithography / Multiple patterning / Photolithography / Immersion lithography / Optical proximity correction / Resist / Lithography / Electron beam lithography / Microtechnology / Materials science / Technology](https://www.pdfsearch.io/img/bf63c8f5b5e3afad8c4136f11331858e.jpg)
| Document Date: 2014-11-07 14:34:17 Open Document File Size: 1,03 MBShare Result on Facebook
Company Synopsys Inc. / / Country United States / / IndustryTerm buried metal line / actual device / viewer tool / technology nodes / technology options / technology step / semiconductor device / process integration technologies / shared-memory hardware / manufacturing applications / Technology simulation / layout tools / multi-core systems / projection systems / parallel processing / e-beam / manufacturing / manufacturing process development / exposure tool / cockpit tool / costeffective computation lithography solution / verification tool / / / Position layout editor / lithography engineer / integrated layout editor / local sales representative / / Technology semiconductor / broadband / Patterned wafer substrates Upcoming process integration technologies / Lithography / simulation / parallel processing / GUI / / URL www.synopsys.com / http /
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