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Maskless lithography / Photolithography / Electron beam lithography / Multiple patterning / Resist / Wafer / Lithography / Immersion lithography / Photomask / Technology / Semiconductor device fabrication / Microtechnology


Charting CEBL’s Role in Mainstream Semiconductor Lithography David K. Lam Multibeam Corporation, 4008 Burton Drive, Santa Clara, CA, USA 95054* ABSTRACT E-Beam direct writing (EBDW) requires no masks and affords high r
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Document Date: 2014-06-26 13:06:22

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City

San Francisco / Santa Clara / /

Company

SPIE Alternative Lithographic Technologies / Tennant / Semiconductor Lithography David K. Lam Multibeam Corporation / /

Country

United States / /

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IndustryTerm

disruptive lithography technology / Optical line-printing / potential cost-efficient solution / metal line width / lithography technology / printing lines / lithography Internet-capable mobile devices / technology capability / optical lithography equipment / lithographic technologies / lower beam energy / mature technologies / well-established optical lithography technologies / beam energy / lithography equipment / high volume manufacturing / Parallel processing / power law / e-beam / manufacturing / energy / /

Organization

Pitch Division / /

Person

Yan Borodovsky / /

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Position

conductor / e-beam direct writer / ebeam mask writer / /

ProvinceOrState

California / /

Technology

disruptive lithography technology / optical lithography technologies / lithography / lithography technology / three key technologies / Photomask Technology / mature technologies / Parallel processing / mobile devices / /

URL

www.multibeamcorp.com / /

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