![Integrated circuit layout / Multiple patterning / Electronic engineering / Design rule checking / Process migration Integrated circuit layout / Multiple patterning / Electronic engineering / Design rule checking / Process migration](https://www.pdfsearch.io/img/10fc69165e3503d56d46488722a1586f.jpg) Date: 2014-06-17 16:11:45Integrated circuit layout Multiple patterning Electronic engineering Design rule checking Process migration | | Sagantec announces nmigrate™ Migration and DRC correction tool for advanced nanometer technologies SANTA CLARA, California – May 14, 2012 – Sagantec announced today its nmigrate layout migration and optimization toAdd to Reading ListSource URL: www.sagantec.comDownload Document from Source Website File Size: 116,48 KBShare Document on Facebook
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