| Document Date: 2009-03-25 10:39:55
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Company Philips / ASML / / Continent Europe / / Country Japan / United States / / / / IndustryTerm substrate devices / nm devices / graphy tool maker / immersion technology / metrology equipment / ion beam deposition tool / process equipment / metrology tools / / Organization Information Society / The Netherlands EUREKA MEDEA+ Office / European Union / / Person Jan Hendrik Peters / / / Position leader / co-operative / / / PublishedMedium the Information Society / / Technology semiconductor / Lithography / immersion technology / EUV technologies / / URL http /
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PROJECT RESULT Lithography T404: Extreme UV lithography masks (EXTUMASK)