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Extreme ultraviolet lithography / Photoresist / Applied Materials / Semiconductor device fabrication / Intel / Resist / Samsung / Immersion lithography / Multiple patterning / Microtechnology / Materials science / Technology


We Create Solutions[removed]NW Monroe Ave • Suite 203 • Corvallis, OR 97330 • [removed] Samsung, Intel Capital and Applied Materials Fund Inpria to Develop Advanced Semiconductor Materials
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Document Date: 2014-02-18 00:25:01


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City

Corvallis / /

Company

Applied Materials Inc. / Inpria Corporation / Samsung Venture Investment Corporation / Intel Capital / 3M / Applied Ventures / Samsung Group / Applied Materials Fund / Samsung Ventures Investment Corporation / /

Currency

USD / /

/

Event

Funding / /

IndustryTerm

photopatternable metal oxide films / process technology / semiconductor devices / venture capital arm / electronic devices / manufacturing semiconductor devices / semiconductor patterning technologies / nanoscale imaging / chemical materials / simplified processing / /

Organization

M&A / /

Person

Andrew Grenville / Dong-Su Kim / Sean Doyle / Eileen Tanghal / /

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Position

director / General Manager / President and CEO / Vice President / /

ProvinceOrState

Oregon / /

Technology

semiconductor / semiconductor patterning technologies / semiconductor devices / lithography / process technology / /

URL

www.inpria.com / www.samsungventures.com / www.intelcapital.com / www.appliedventures.com / /

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