Back to Results
First PageMeta Content
Semiconductor device fabrication / Extreme ultraviolet lithography / Multiple patterning / Photolithography / Photomask / Immersion lithography / Overlay Control / Optical proximity correction / Mask shop / Microtechnology / Materials science / Nanotechnology


Document Date: 2009-12-31 00:00:39

Open Document

File Size: 294,04 KB

Share Result on Facebook

Company

Lithography Exposure Tool Potential Solutions / Lithography International Technology Working Group / /

Facility

Factory Integration / /

IndustryTerm

successive technology generation / Liquid immersion imaging / multibeam systems / wafers/device / lithographic technology / nm technology / mask infrastructure / optical solutions / sub-wavelength imaging / wafer run device / metrology tools / mm diameter wafer infrastructure / volume products / potential solutions / equipment infrastructure / technology requirements / capital equipment / manufacturing / low k1 solutions / technology option / 1X technology / imaging / manufacturing variations / /

MusicAlbum

Control / Mask / /

Organization

ASIC / /

Position

collector / designer / Chip Size Model Technology Trend Targets / COO / /

Technology

ASIC / 10 Maskless Technology / lithography technologies / DOUBLE PATTERNING/SPACER TECHNOLOGY / 248 nm technology / EUV technology / 1X technology / Lithography Technology / Simulation / PROCESS CONTROL / integrated circuits / Flash / generation lithographic technology / integrated circuit / CMP / /

SocialTag