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Technology / Microelectromechanical systems / Nanoimprint lithography / Etching / Deep reactive-ion etching / Reactive-ion etching / Nanolithography / 16 nanometer / 11 nanometer / Materials science / Microtechnology / Semiconductor device fabrication


NOVEL APPROACH TO PRODUCE NANOPATTERNED TITANIUM IMPLANTS BY COMBINING NANOIMPRINT LITHOGRAPHY AND REACTIVE ION ETCHING.
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Document Date: 2010-08-27 05:33:00

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File Size: 1,74 MB

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City

Oxford / /

Company

Sigma Aldrich / Rohm and Haas / Alcatel / Nel A.E. / Oxford Instruments / /

Country

Netherlands / /

Currency

USD / /

/

Facility

MESA+ Institute / University of Twente / Radboud University Nijmegen Medical Centre / /

IndustryTerm

dry etching equipment / electronics / gas flow / imaging / positive chemical / /

Organization

MESA+ Institute for Nanotechnology / University of Twente / Dutch Technology Foundation / Electrochemical Society / Radboud University Nijmegen Medical Centre / /

Person

ION ETCHING / /

/

Position

author / representative / /

ProgrammingLanguage

NIL / /

Technology

Chemical Mechanical Polishing / laser / LITHOGRAPHY / MEMS / Biomaterials / CMP / fabricated using laser interference lithography / /

SocialTag