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Date: 2012-12-19 13:50:58 Nanoimprint lithography Microtechnology Photolithography Lithography Resist Nanotechnology NX Wafer Technology Materials science Semiconductor device fabrication		Press Release Tel: [removed]Fax: [removed] Add to Reading List Source URL: www.nanonex.com Download Document from Source Website File Size: 94,60 KB Share Document on Facebook

	Bruker Optics Application Note Wafer ATR によるシリコンウェハー表面の高精度分析はじめにシリコンウェハー（Si ウェハー）表面の特性は、材料 DocID: 1vfx9 - View Document
	A 1.02nW PMOS-Only, Trim-Free Current Reference with 282ppm/°C from -40°C to 120°C and 1.6% within-Wafer Inaccuracy Qing Dong1, Inhee Lee1, Kaiyuan Yang1,2, David Blaauw1, and Dennis Sylvester1 1 DocID: 1v0kW - View Document
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	丹東新東方晶体技器有限公司 It can measure wafer reference-side angle. If you want to measure ingot reference-side angle, wafer endface angle, it can be ロッキングカーブ測定装置 DX-9BG DocID: 1uJXM - View Document