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Nanotech
Results: 309

#	Item
181	GaAs/AlGaAs RIE Etching at the UCSB Nanofabrication Facility Chlorine Etcher 1 – Parallel Plate RIE #1 Add to Reading List Source URL: www.nanotech.ucsb.edu Language: English - Date: 2013-01-06 22:10:49 Microtechnology Etching Aluminium gallium arsenide Gallium arsenide Chemistry Materials science Semiconductor device fabrication
182	Shipley i-Line Photoresist i Add to Reading List Source URL: www.nanotech.ucsb.edu Language: English - Date: 2013-01-06 22:10:48 Chemistry Technology Photoresist Polymers Microelectromechanical systems Wafer 1 micrometre Printing 100 micrometres Materials science Semiconductor device fabrication Microtechnology
183	Cap-On Bilayer Lift-Off Process Add to Reading List Source URL: www.nanotech.ucsb.edu Language: English - Date: 2013-01-06 22:10:47 Science of photography Resist Exposure Ultraviolet ΔT Technology Physics Time Microtechnology Semiconductor device fabrication Photolithography
184	MCC PRODUCT ATTRIBUTES NANO PMMA and Copolymer • Submicron linewidth control Add to Reading List Source URL: www.nanotech.ucsb.edu Language: English - Date: 2013-01-06 22:10:48 Poly Thermoplastics Spin coating Photoresist LIGA Resist Electron beam lithography Gallium arsenide Chemistry Materials science Semiconductor device fabrication
185	The Big Ideas of Nanoscience Angela Berenstein, Academic Coordinator National Nanotechnology Infrastructure Network The Big Ideas Add to Reading List Source URL: www.nanotech.ucsb.edu - Date: 2013-01-06 22:11:10
186	Ti-deep Etching at the UCSB Nanofabrication Facility Panasonic E640 ICP Etcher Panasonic E640 ICP Etcher • Multi-Purpose ICP etcher Add to Reading List Source URL: www.nanotech.ucsb.edu Language: English - Date: 2013-01-06 22:10:49 Technology Semiconductor device fabrication Microtechnology Etching
187	Microsoft Word - vh_man_2400_en_05112903_ls.doc Add to Reading List Source URL: www.nanotech.ucsb.edu Language: English - Date: 2013-01-06 22:10:47 Technology Photoresist Polymers Spin coating Resist Deep reactive-ion etching Ultraviolet Etching Photolithography Semiconductor device fabrication Materials science Microtechnology
188	P R O D U C T B U L L E T I N AZ® nLOFTM 5000 Photoresist Add to Reading List Source URL: www.nanotech.ucsb.edu Language: English - Date: 2013-01-06 22:10:48 Semiconductor device fabrication Photoresist Polymers Resist Lift-off Materials science Microtechnology Chemistry
189	Cr Etching at the UCSB Nanofabrication Facility Panasonic E640 ICP Etcher Panasonic E640 ICP Etcher • Multi-Purpose ICP etcher Add to Reading List Source URL: www.nanotech.ucsb.edu Language: English - Date: 2013-01-06 22:10:49 CL2 Technology Semiconductor device fabrication Microtechnology Etching
190	D A T A S H E E T ® AZ Developer, 400K, and 421K Add to Reading List Source URL: www.nanotech.ucsb.edu Language: English - Date: 2013-01-06 22:10:49 Photoresist Polymers Photographic developer Debian Software Chemistry Photographic processes Materials science

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