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Thin film deposition / Semiconductor device fabrication / Plasma processing / Thin films / Ceramic materials / Atomic layer deposition / Chemical vapor deposition / Amorphous silicon / Polycrystalline silicon / Chemistry / Manufacturing / Materials science


Dayrl Briggs Lead Cleanroom Engineer Nanofabrication Research Laboratory Center for Nanophase Materials Sciences Oak Ridge National Laboratory[removed]
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Document Date: 2012-08-09 15:06:17

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City

Birmingham / Dallas / /

Company

Oak Ridge National Laboratory / Al. Electronics Engineering A.A.S. / Nanophase Materials Sciences Oak Ridge National Laboratory / Atmel Semiconductor Corp. / Intel Corp. / Texas Instruments / Vitesse Semiconductor / Present Lead Cleanroom / /

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Facility

Nanophase Materials Sciences Oak Ridge National Laboratory / RETS Electronics Institute / /

IndustryTerm

technology allowing / metal thin-films / process gas distribution design / /

Organization

Dayrl Briggs Lead Cleanroom Engineer Nanofabrication Research Laboratory Center for Nanophase Materials Sciences Oak Ridge National Laboratory / Electronics Institute / /

Person

Lab Space / Diffusion / Ion Implant / /

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Position

Equipment Maintenance Manager / Technician / Equipment Engineering Technician / Manager / Center / Equipment Engineering Manager / Equipment Engineer / Engineer / /

ProvinceOrState

Colorado / /

Technology

CVD / /

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