Japan Electronics / ICF International / PFC Emissions Reduction/Climate Partnership / /
Country
United States / /
Currency
CHF / /
Event
Environmental Issue / FDA Phase / /
Facility
Taiwan’s Industrial Technology Research Institute / /
IndustryTerm
process tool / analytical measurement systems / appropriate personal protective equipment / electronics manufacturing sector / chemical-spiking approach / required/expected systems / tool operator / electronics sectors / electronics manufacturing facilities / gas suppliers / etch process equipment / electronics products / manufacturing practices / analytical tools / semiconductor systems / abatement systems / multi-chamber process tools / operational plasma abatement systems / plasma systems / gas supplies / in-fab abatement systems / gas flow rates/process recipe / manufacturing / plasma-enhanced chemical vapor deposition / sampled gas / in-fab production processing circumstances / normal production processing / thermal abatement systems / electronic products / voluntary fluorinated greenhouse gas / process tools / fluorinated greenhouse gas / manufacturing processes / chemical spills / product manufacturing / micro-electro-mechanical systems / semiconductor manufacturing facilities / modifying manufacturing processes / /
Organization
Taiwan’s Industrial Technology Research Institute / Japan Electronics and Information Technology Industries Association / Information Technology Industries Association / Semiconductor Industry Association / U. S. Environmental Protection Agency / Industrial Technology Research Institute / Air and Radiation office of Atmospheric Programs / office of Air / Environmental Protection Agency / Executive Board of the Clean Development Mechanism / /
Product
Koss R-10 Headphone/Headset / POU F / CF4 / /
ProgrammingLanguage
C / C* / /
Technology
semiconductor / 5 1.1 Protocol / Radiation / MEMS / 1.3 Protocol Scope The Protocol / Information Technology / 1.5 Expected Results This Protocol / 1 Protocol / 4 1.2 Protocol / CVD / chemical vapor deposition / /
Draft Semiconductor Abatement Protocol