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Optical devices / Wave mechanics / Laser beam profiler / Coherence / Laser / Van Cittert–Zernike theorem / Photolithography / Physics / Optics / Technology


Numerical Modelling and Measurement of Spatial Coherence in a Lithographic System by Arlene Smith Supervisor: Prof. Chris Dainty
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Document Date: 2011-09-28 03:42:58


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File Size: 3,76 MB

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Company

Lithographic Systems / Hewlett Packard / Applied Optics Group / /

Facility

National University of Ireland Galway September / /

IndustryTerm

lithography systems / wafer-stepper systems / non-imaging beam homogenization system / /

Organization

National University of Ireland Galway / Irish Research Council for Science / Engineering and Technology / School of Physics / Science Foundation Ireland / /

Person

Catherine / Chris Dainty / Kevin Conlisk / Elizabeth / Conor McBrierty / Pauline / Elaine / Connell Conlisk / Caroline / Tess / Anna Burvall / /

Position

supervisor / /

Technology

laser / lithography / Simulation / lasers / integrated circuits / /

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