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Semiconductor device fabrication / Tungsten compounds / Nonmetals / Superhard materials / Tungsten carbide / Oxide / Tungsten / Etching / Carbon / Chemistry / Matter / Chemical elements


1401 Reaction of Oxygen Plasma with Hydrogenated W-C Deposits
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Document Date: 2014-07-21 14:39:02


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City

Ljubljana / /

Company

The AES / /

Country

Slovenia / /

Currency

pence / /

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Facility

Jozef Stefan Institute / ITER reactor / /

IndustryTerm

reaction products / pass energy / chemical erosion / stainless steel / eV energy step / chemical composition / deposition device / chemical methods / suitable metal / energy / flat metal oxides / /

MarketIndex

case 20 / /

Organization

Ministry of Higher Education / Science and Technology of the Republic of Slovenia / Jozef Stefan Institute / EURATOM / European Commission / /

Person

A. Litnovsky / V / Marianne Balat-Pichelin / C. Hopf / V / W. Jacob / V / J. A. Ferreira / V / I. Tanarro / V / /

Technology

radiation / spectroscopy / laser / microwave / X-ray / recombination / flash / /

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