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Semiconductor device fabrication / Plasma processing / Ceramic materials / Chemical vapor deposition / Metalorganic vapour phase epitaxy / Silicon nitride / Plasma-enhanced chemical vapor deposition / Silicon dioxide / Aluminium gallium nitride / Chemistry / Thin film deposition / Nitrides


PROCESS AND EQUIPMENT SIMULATION OF CHEMICAL VAPOR DEPOSITION Velocity
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Document Date: 2015-01-15 20:38:12


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File Size: 443,54 KB

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