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Plasma processing / Thin film deposition / Technology / Coatings / Vacuum / Thin film / Chemical vapor deposition / Plasma / Etching / Semiconductor device fabrication / Materials science / Chemistry


Application Note ASTRONĀ® Remote Plasma Source for Thin-Film Photovoltaic Process Chamber Cleaning PROBLEM The layers in a thin film photovoltaic (TFPV) device are deposited using deposition techniques, some of which hav
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Document Date: 2013-04-15 15:40:35


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City

Andover / /

Company

MKS Instruments Inc. / SLM / ASTRON / /

Country

United States / /

Event

Environmental Issue / /

Facility

MKS Global Headquarters / /

IndustryTerm

chamber cleaning solution / gas flow / reactive gas precursor stream / stainless steel / thinfilm processing equipment / conventional in-situ plasma systems / gas velocity / remote plasma technology / high gas velocities / feed gas / reactive gas stream / precursor gas / reactive precursor gas / aqueous hydrofluoric acid solution / plasma deposition tools / plasma-assisted cleaning systems / solar photovoltaic manufacturing processes / gas flows / induction law / chemical vapor deposition / plasma source technology / source gas / high gas flow rates / plasma process deposition tools / manufacturing / large scale processing / chamber cleaning applications / gas transport lines / potent greenhouse gas / wetted metal surfaces / process tools / chamber clean applications / /

MedicalCondition

nearly complete dissociation / lower dissociation / dissociation / /

Organization

G7 / Environmental Protection Agency / /

Person

Table / /

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Position

Sales Engineer / Impact COO / /

Product

NF3 / /

ProvinceOrState

Massachusetts / /

Technology

semiconductor / remote plasma technology / plasma source technology / recombination / CVD / chemical vapor deposition / /

URL

www.mksinst.com / /

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