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Ions / Thin film deposition / Plasma processing / Matter / Plasma physics / Sputter deposition / Ion source / Plasma / Ion beam / Chemistry / Physics / Semiconductor device fabrication


Plasma Source Atom Source, Ion Source and Atom/Ion Hybrid Source The tectra Plasma Source* is a multi-purpose source which can easily be user configured to produce either atoms or ions and finds uses in a wide range of H
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Document Date: 2003-12-07 12:39:31


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Company

tectra GmbH / Thin Solid Films / Angewandte Physik tectra GmbH / /

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Facility

University of Hamburg / /

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IndustryTerm

metal / beam energy / microwave energy / low kinetic energy / gas flow / thin film processing / gas load / higher kinetic energy / controllable energy / energy range / steel / energy / /

Organization

University of Hamburg / /

Person

Ion Assisted / J. Offermann / R. Anton / A. A. Schmidt / Ion Source / /

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Position

General / /

Technology

microwave / dielectric / /

URL

www.tectra.de / /

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