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Chemistry / Materials science / Thin film deposition / Thin films / Plasma-immersion ion implantation / Plasma / Ion implantation / Debye sheath / Langmuir probe / Physics / Semiconductor device fabrication / Plasma physics


Document Date: 2002-08-19 17:38:22

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City

Dresden / /

Currency

pence / /

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Facility

Subroto Mukherjee* Institute of Ion Beam Physics / /

IndustryTerm

approximate analytical solution / low-energy extrapolation31 / surface binding energy / Long time solutions / plasma processing / high-energy species / sufficient recoil energy / electronic energy loss results / energy distribution results / kinetic energy / high ion energy / approximate solution / electronic energy loss / minimum threshold energy / ion energy distribution / chemical vapour deposition / electronics / mechanical applications / deposited energy distributions / high energy / low-energy extrapolation / free electron gas / energy deposition distributions / filtered cathodic arc device / mean energy results / simultaneous energy loss / chemical reaction / low-energy / lower energy / long processing times / energy spectrum / physical and chemical effects / possible applications / energy distribution / ion energy / average energy loss / actual and potential applications / numerical solution / energy / steel / /

MusicAlbum

Side / /

Organization

Institute for Plasma Research / Subroto Mukherjee* Institute of Ion Beam Physics and Materials Research / Germany *Facilitation Centre for Industrial Plasma Technologies / /

Person

Ion Beam / /

Position

Rt / /

Technology

radiation / laser / sublimation / semiconductors / simulation / /

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