Japan Silicon Systems Research Laboratories / Charles Evans and Associates / Elsevier Science B.V. / NEC Corporation / /
Country
Japan / / /
Facility
University of Tsukuba / National Institute of Advanced Industrial Science / /
IndustryTerm
positron implantation energy / variable-energy positron annihilation spectroscopy / positron energy / incident positron energy / positron incident energy / energy / /
Organization
University of Tsukuba / Institute of Applied Physics / National Institute of Advanced Industrial Science and Technology / /
Applied Surface Science–115 Oxygen-related defects and their annealing behavior in low-dose Separation-by-IMplanted OXygen (SIMOX) wafers studied by slow positron beams Z.Q. Chena,*, Akira Uedonoa, Atsu